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Graphene nanoribbon FETs for digital electronics: experiment and modeling

机译:用于数字电子产品的石墨烯纳米带FET:实验和建模

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摘要

One-dimensional nanostructures of graphene such as graphene nanoribbons (GNRs) can prove attractive for digital electronics in the form of interband tunneling transistors, as they are capable of high drive currents. Here, we report on the transport properties of p-n junctions formed in GNR field effect transistors (FETs). It is found that the current density in the devices is indeed high; in the 1-1.5 A/mm range have been measured, comparable to Si-MOSFETs and III-V Nitride HEMTs. The observed unique current-voltage characteristics of the double-gated GNR FETs having a lateral p-n junction as their channel is explained by a field-effect model. Due to the lack of sufficiently large bandgap in the 30 nm wide GNR, the device still cannot be turned off completely, but rectification is achieved. The results suggest that the fabrication of tunneling FETs made out of graphene is possible and their characteristics may meet the expectations.
机译:石墨烯的一维纳米结构,例如石墨烯纳米带(GNR),由于具有高驱动电流,因此以带间隧穿晶体管的形式被证明对数字电子具有吸引力。在这里,我们报告在GNR场效应晶体管(FET)中形成的p-n结的传输特性。发现器件中的电流密度确实很高。与Si-MOSFET和III-V氮化物HEMT相比,测量值在1-1.5 A / mm范围内。场效应模型解释了观察到的具有侧向p-n结作为其沟道的双栅极GNR FET的独特电流-电压特性。由于30 nm宽的GNR中没有足够大的带隙,该器件仍然无法完全关闭,但可以实现整流。结果表明由石墨烯制成的隧穿FET的制造是可能的,并且它们的特性可以满足期望。

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