机译:等离子聚焦装置制备的铜钨电触头的结构和电流电压特性
Baikov Institute of Metallurgy and Materials Science, Russian Academy of Sciences, Moscow, Russia;
Baikov Institute of Metallurgy and Materials Science, Russian Academy of Sciences, Moscow, Russia;
Baikov Institute of Metallurgy and Materials Science, Russian Academy of Sciences, Moscow, Russia;
Lebedev Institute of Physics, Russian Academy of Sciences, Moscow, Russia;
Baikov Institute of Metallurgy and Materials Science, Russian Academy of Sciences, Moscow, Russia;
Baikov Institute of Metallurgy and Materials Science, Russian Academy of Sciences, Moscow, Russia;
electric resistance; plasma focus; electric contacts; chemically noninteracting elements;
机译:具有肖特基触点的金属铁电金属结构。二。 Pb(Zr,Ti)O_3薄膜的实验电流-电压和电容-电压特性分析
机译:等离子体与电极的触点的电流 - 电压特性在表面上具有薄介电膜的电极
机译:远程等离子体原位原子层掺杂制备的氮控ZnO薄膜的局部电子结构和电学特性
机译:阴极等离子体接触器的羽状结构和电流-电压特性分析
机译:等离子体中导体-介质盘的鞘结构和电流-电压特性的数值模拟。
机译:使用聚焦离子束技术的欧姆接触制备和层半导体纳米结构的电学表征
机译:电势对2Cr13不锈钢制备的氮化层的微观结构,氮化层的耐腐蚀特性