Influence of Hydrogen on the Structure of Cerium Films Obtained by Magnetron Sputter Deposition on Semiconductor Wafers

摘要

The influence of hydrogen on the structure of thin cerium films formed by the method of magnetron sputter deposition was investigated in this work. Hydrogen-charging of the films was carried out by the method of Langmuir hydrogen dissociation on a tungsten substrate. The cerium hydride films were coated with a protective layer of nickel or chromium. It is demonstrated in this work that the used method of hydrogen charging can be used for introduction of hydrogen also into other hydride-forming metals and alloys.