IPMA Rocks Graph Expo

摘要

IPMA had a big presence at Graph Expo 2016 in Orlando this year. IPMA's booth was the "in-plant hub" at the show, with roundtables set to have open discussions about the needs and concerns of in-plant professionals. IPMA also hosted a luncheon on Monday, September 26, which was generously co-sponsored by Canon U.S.A., Inc., Ricoh, Rochester Software Associates, XMPie, and Web To Print Shop. The luncheon featured cutting-edge presentations from two of the industry's most influential leaders. Dr. Joe Webb, a notable industry forecaster, analyst and consultant, kicked off the luncheon with his presentation of the final report on the "State of the Industry: Outlook, Challenges and Opportunities" survey, which was sponsored by Canon U.S.A., Inc. His presentation delivered a critical analysis and thought-provoking look at key areas that are of high importance to department managers across the nation.