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Avalanche Noise Generation Profile along Active Zone of Impact diodes

机译:冲击二极管有源区的雪崩噪声产生曲线

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摘要

A generalised computer method to study the avalanche noise generation profile along the depletion layer of IMPATT diodes has been described. The method has been applied to different silicon flat profile SDR (single drift region) and DDR (double drift region) structures. The results o the analysis provide the intensity of noise generation at every space point in the active layer of the diode due to individual noise sources located at various space points.
机译:已经描述了一种通用的计算机方法,用于研究沿IMPATT二极管耗尽层的雪崩噪声产生曲线。该方法已应用于不同的硅平面轮廓SDR(单漂移区)和DDR(双漂移区)结构。分析的结果提供了由于位于各个空间点的各个噪声源而在二极管的有源层中每个空间点产生噪声的强度。

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