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In-Plane Bandgap Energy Controlled Selective MOVPE and Its Applications to Photonic Integrated Circuits

机译:面内带隙能量控制选择性MOVPE及其在光子集成电路中的应用

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摘要

Photonic integrated circuits (PICs) are required for future optical communication systems, because various optical components need to be compactly integrated in one-chip configurations with a small number of optical alignment points. Bandgap energy controlled selective metalorganic vapor phase epitaxy (MOVPE) is a breakthrough technique for the fabrication of PICs because this technique enables the simultaneous formation of waveguides for various optical components in one-step growth. Directly formed waveguides on a mask-patterned substrate can be obtained without using conventional mesa-etching of the semiconductor layers. The waveguide width is precisely controlled by the mask pattern. Therefore, high device uniformity and yield are expected. Since we proposed and demonstrated this technique in 1991, various PICs have been reported. Using electroabsorption modulator integrated distributed feedback laser diodes, 2.5 Gb/s-550 km transmission experiments have been successfully conducted. Another advantage of the selective MOVPE technique is the capability to form narrow waveguide layers. We have demonstrated a polarization-insensitive semiconductor optical amplifier that consists of a selectively formed narrow (less than 1 μm wide) bulk active layer. For a four-channel array, a chip gain of more than 20 dB and a gain difference between TE and TM inputs of less than 1 dB were obtained. We have also reported an optical switch matrix and an optical transceiver PIC for access optical networks. By using a low-loss optical waveguide, a 0 dB fiber-to-fiber gain for the 1 x 4 switch matrix and 0 dBm fiber output power from the 1.3 μm transceiver PIC were obtained. In this paper, the selective MOVPE technique and its applications to various kinds of PICs are discussed.
机译:未来的光通信系统需要光子集成电路(PIC),因为各种光学组件需要紧凑地集成在具有少量光学对准点的单芯片配置中。带隙能量控制的选择性金属有机气相外延(MOVPE)是制造PIC的一项突破性技术,因为该技术能够在一步生长中同时形成用于各种光学组件的波导。无需使用常规的半导体层的台面蚀刻就可以获得在掩模图案的衬底上直接形成的波导。波导宽度由掩模图案精确控制。因此,期望高的器件均匀性和成品率。自从我们在1991年提出并证明了这种技术以来,已经报道了各种PIC。使用集成了分布式反馈激光二极管的电吸收调制器,已经成功进行了2.5 Gb / s-550 km的传输实验。选择性MOVPE技术的另一个优点是能够形成狭窄的波导层。我们已经展示了一种对偏振不敏感的半导体光放大器,它由选择性形成的窄(小于1μm宽)体有源层组成。对于四通道阵列,可以获得大于20 dB的芯片增益,并且TE和TM输入之间的增益差小于1 dB。我们还报告了用于接入光网络的光交换矩阵和光收发器PIC。通过使用低损耗光波导,可获得用于1 x 4开关矩阵的0 dB光纤到光纤增益和来自1.3μm收发器PIC的0 dBm光纤输出功率。本文讨论了选择性MOVPE技术及其在各种PIC中的应用。

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