机译:磁控溅射第三电极沉积ZnO薄膜的氢等离子体退火
Faculty of Engineering, Nagaoka University of Technology, Nagaoka-shi, 940-2188 Japan;
Faculty of Engineering, Nagaoka University of Technology, Nagaoka-shi, 940-2188 Japan;
Faculty of Engineering, Nagaoka University of Technology, Nagaoka-shi, 940-2188 Japan;
Faculty of Engineering, Nagaoka University of Technology, Nagaoka-shi, 940-2188 Japan;
Faculty of Engineering, Nagaoka University of Technology, Nagaoka-shi, 940-2188 Japan;
Faculty of Engineering, Nagaoka University of Technology, Nagaoka-shi, 940-2188 Japan;
sputtering; mesh electrode; zinc oxide; plasma annealing;
机译:退火对透明电极射频磁控溅射沉积铝掺杂ZnO薄膜的影响
机译:射频磁控溅射沉积ZnO薄膜:退火和气氛条件对光催化制氢的影响
机译:高功率脉冲磁控溅射和直流磁控溅射在含氢等离子体中沉积的β-Ta和α-Cr薄膜
机译:磁控溅射氧化锌膜对退火温度对ZnO薄膜的影响
机译:使用不平衡磁控溅射制造适用于薄膜晶体管的掺镓ZNO薄膜。
机译:快速热退火用于射频磁控溅射沉积的高质量ITO薄膜
机译:通过高功率脉冲磁控溅射和直流磁控溅射在含氢等离子体中沉积的β-Ta和α-Cr薄膜