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All MgB_2 Josephson Junctions with Amorphous Boron Barriers

机译:所有具有非晶硼阻挡层的MgB_2 Josephson结

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All MgB_2 Josephson junctions with amorphous boron barriers have been fabricated on C-plane sapphire substrates by using a co-evaporation method. The junctions showed Josephson currents and the nonlinear current-voltage characteristics which seem to reflect the superconducting energy gap. The critical current was observed when the thickness of the amorphous boron was in the range of 5 nm to 20 nm. The critical current density was estimated to be 0.4 A/cm~2 to 450 A/cm~2. By observing he temperature dependence of the critical current we found that the junction had a critical temperature of 10 K and a normal layer in its barrier structure.
机译:通过共蒸镀法在C面蓝宝石衬底上制造了具有无定形硼势垒的所有MgB_2 Josephson结。结显示约瑟夫森电流和非线性电流-电压特性,似乎反映了超导能隙。当非晶硼的厚度在5nm至20nm的范围内时,观察到临界电流。临界电流密度估计为0.4 A / cm〜2至450 A / cm〜2。通过观察临界电流对温度的依赖性,我们发现结的临界温度为10 K,并且势垒结构中存在正常层。

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