首页> 外国专利> JOSEPHSON TUNNEL JUNCTION DEVICE HAVING TUNNEL BARRIER OF AMORPHOUS SILICON COMBINED WITH HYDROGEN* GERMANIUM OR SILICON GERMANIUM ALLOY

JOSEPHSON TUNNEL JUNCTION DEVICE HAVING TUNNEL BARRIER OF AMORPHOUS SILICON COMBINED WITH HYDROGEN* GERMANIUM OR SILICON GERMANIUM ALLOY

机译:具有非晶硅与氢*锗或硅锗合金结合的隧道屏障的JOSEPHSON隧道结装置

摘要

A Josephson tunnel junction device having niobium superconductive electrodes with an amorphous hydrogenated semiconductor tunnelling barrier therebetween comprised of silicon or germanium or an alloy thereof supports an unusually high critical current density. Barrier dopants provide a further increase in the critical current density. The barrier is deposited by rf-sputtering in an atmosphere containing hydrogen.
机译:约瑟夫森隧道结器件具有铌超导电极,其间由硅或锗或其合金组成的非晶态氢化半导体隧道势垒支持异常高的临界电流密度。势垒掺杂剂进一步增加了临界电流密度。通过在包含氢的气氛中进行射频溅射来沉积阻挡层。

著录项

  • 公开/公告号JPS54146993A

    专利类型

  • 公开/公告日1979-11-16

    原文格式PDF

  • 申请/专利权人 SPERRY RAND CORP;

    申请/专利号JP19790056208

  • 发明设计人 HARII KUROGAA;

    申请日1979-05-08

  • 分类号H01L39/22;H01L39/24;

  • 国家 JP

  • 入库时间 2022-08-22 19:03:01

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