Lamp configuration design for rapid thermal processing systems

摘要

We have studied lamp configuration design for rapid thermalnprocessing (RTP) systems. We considered a configuration consisting ofnfour concentric circular lamp zones, three of them above the wafer andnone circumventing the wafer. We propose a method to determine thengeometric parameters, the width, height and radius, of the lamp zones sonthat the configuration designed has the capacity to achieve a uniformntemperature on the wafer. The method is based on a necessary andnsufficient condition for uniform temperature tracking and analyticnexpressions of the view factors. A design example is given in which anleast square open-loop control law yields good temperature uniformity