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首页> 外文期刊>IEEE Transactions on Semiconductor Manufacturing >Highly sensitive inspection system for lithography-related faults in agile-fab - detecting algorithm for monitoring and evaluation of yield impact
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Highly sensitive inspection system for lithography-related faults in agile-fab - detecting algorithm for monitoring and evaluation of yield impact

机译:敏捷制造中与光刻相关的故障的高灵敏度检查系统-监视和评估良率影响的检测算法

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摘要

The authors performed automatic detection of lithography-related faults by characteristic factors calculated from fail bit count (FBC) data. They used the autocorrelation function to define a characteristic factor for a certain lithography-related failure mode. The frequency of lithography-related faults was monitored as time series data. Also, components of the characteristic factor quantified the direction of the inclination of lithography-related patterns. They changed according to time. The origin of faults varies with patterns. Thus, it is presumed that their causes differed with each period. Fault sourcing for a failure mode was carried out by correlating machine data and the characteristic factor with Χ2 test. Since the characteristic factor included only one failure factor, this test could be performed with high sensitivity. The authors classified lithography-related faults and evaluated their yield impact from their frequency and yield loss automatically.
机译:作者通过根据故障位计数(FBC)数据计算出的特征因子,自动检测了与光刻相关的故障。他们使用自相关函数为某些与光刻相关的故障模式定义了特征因子。光刻相关故障的频率作为时间序列数据进行监控。而且,特征因子的成分量化了与光刻相关的图案的倾斜方向。他们根据时间而改变。故障的来源随模式而变化。因此,可以推测其原因在每个时期都不同。通过将机器数据和特征因子与Χ2测试相关联,进行故障模式的故障源。由于特征因素仅包括一个故障因素,因此可以高灵敏度执行该测试。作者对与光刻相关的故障进行了分类,并根据其频率和产量损失自动评估了其产量影响。

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