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首页> 外文期刊>IEEE Transactions on Semiconductor Manufacturing >Highly sensitive inspection system for lithography-related faults in agile-fab - detecting algorithm for monitoring and evaluation of yield impact
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Highly sensitive inspection system for lithography-related faults in agile-fab - detecting algorithm for monitoring and evaluation of yield impact

机译:敏捷制造中与光刻相关的故障的高灵敏度检查系统-监视和评估良率影响的检测算法

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摘要

The authors performed automatic detection of lithography-related faults by characteristic factors calculated from fail bit count (FBC) data. They used the autocorrelation function to define a characteristic factor for a certain lithography-related failure mode. The frequency of lithography-related faults was monitored as time series data. Also, components of the characteristic factor quantified the direction of the inclination of lithography-related patterns. They changed according to time. The origin of faults varies with patterns. Thus, it is presumed that their causes differed with each period. Fault sourcing for a failure mode was carried out by correlating machine data and the characteristic factor with /spl chi//sup 2/ test. Since the characteristic factor included only one failure factor, this test could be performed with high sensitivity. The authors classified lithography-related faults and evaluated their yield impact from their frequency and yield loss automatically.
机译:作者通过根据故障位计数(FBC)数据计算出的特征因子,自动检测了与光刻相关的故障。他们使用自相关函数为某些与光刻相关的故障模式定义了特征因子。光刻相关故障的频率作为时间序列数据进行监控。而且,特征因子的成分量化了与光刻相关的图案的倾斜方向。他们根据时间而改变。故障的来源随模式而变化。因此,可以推测其原因在每个时期都不同。通过将机器数据和特征因子与/ spl chi // sup 2 /测试相关联来执行故障模式的故障源。由于特征因素仅包括一个故障因素,因此可以高灵敏度执行该测试。作者对与光刻相关的故障进行了分类,并根据其频率和产量损失自动评估了其产量影响。

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