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首页> 外文期刊>IEEE Transactions on Semiconductor Manufacturing >A novel one step integration of edge-emitting laser diode withmicro-elliptical lens using focused ion beam direct deposition
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A novel one step integration of edge-emitting laser diode withmicro-elliptical lens using focused ion beam direct deposition

机译:聚焦离子束直接沉积的边缘发射激光二极管与微椭圆透镜的新型一步集成

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摘要

An edge-emitting laser diode (LD) integrated with a microlens onnits emitting surface for the purpose of collimating and fiber couplingnis introduced in detail in this paper. A micro-elliptical lens isnadopted for the integration in terms of divergence angle in bothnparallel and transverse directions. The lens with dimensions of 50nΜm×30 Μm×4 Μm is microfabricated on the emittingnsurface of the laser diode with operating wavelength of 635 nm directlynby focused ion beam (FIB) deposition function. The SiO2ndeposition is realized by programming of the FIB machine. It is shown byntest results that the focused spot size in the parallel and transversenpropagation directions are 7.9 and 9.1 Μm (at site ofn1/e2), respectively, and the coupling efficiency of thencompact and miniaturized system can reach as high as 71%. Measurednfar-field angles (full angle) with the microlens in both parallel andntransverse directions are 2.2° and 1.2°, respectively. Comparednwith the original divergence angles of 31° and 14° without thenmicro-elliptical lens, they were greatly reduced by this method
机译:为了准直和光纤耦合的目的,在本文中详细介绍了集成有微透镜的边缘发射激光二极管(LD),该表面用于准直和光纤耦合。就平行和横向方向上的发散角而言,采用微椭圆透镜进行积分。通过聚焦离子束(FIB)沉积功能,将尺寸为50nμm×30μm×4μm的透镜直接加工在工作波长为635 nm的激光二极管的发射表面上。 SiO2沉积是通过FIB机器的编程实现的。测试结果表明,在平行和横向传播方向上的聚焦光斑尺寸分别为7.9和9.1微米(在n1 / e2处),然后紧凑和小型化系统的耦合效率可高达71%。微透镜在平行和非横向两个方向上的远视场角(全角)分别为2.2°和1.2°。与没有微椭圆透镜时的原始发散角31°和14°相比,该方法大大减小了发散角

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