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Transient radiation hardness of the CMOSV 1.25 micron technology

机译:CMOSV 1.25微米技术的瞬态辐射硬度

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摘要

Several devices fabricated in the AT&T/Sandia CMOSV 1.25 mu m technology have been characterized for transient radiation hardness. Dose rate upset levels exceeding 10/sup 9/ rad(Si)/s were obtained on 16-bit microprocessor, 64 K SRAM and 256 K SRAM ICs. Experimental data on neutron irradiated parts is given. Secondary photocurrents are shown to exist in logic structures which do not have adequate p-well contact placement. Layout guidelines are developed which allow the IC designer to eliminate secondary photocurrents in a given design.
机译:已经采用AT&T / Sandia CMOSV 1.25μm技术制造的几种器件具有瞬时辐射硬度的特征。在16位微处理器,64 K SRAM和256 K SRAM IC上获得了超过10 / sup 9 / rad(Si)/ s的剂量率不正常水平。给出了中子辐照零件的实验数据。已显示次级光电流存在于逻辑结构中,这些逻辑结构没有足够的p阱触点放置。制定了布局指南,使IC设计人员可以消除给定设计中的次级光电流。

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