首页> 外文期刊>IEEE Transactions on Nuclear Science >The effects of chemical etching on the charge collection efficiency of {111} oriented Cd/sub 0.9/Zn/sub 0.1/Te nuclear radiation detectors
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The effects of chemical etching on the charge collection efficiency of {111} oriented Cd/sub 0.9/Zn/sub 0.1/Te nuclear radiation detectors

机译:化学刻蚀对{111}取向Cd / sub 0.9 / Zn / sub 0.1 / Te核辐射探测器电荷收集效率的影响

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摘要

We report the effects of different etchants on the mobility-lifetime product (/spl mu//spl tau/) of cadmium zinc telluride (CZT). The /spl mu//spl tau/ values were obtained via the Hecht relation. The effects of surface recombination were also investigated using photoconductivity measurements. Results were obtained for a {111} oriented CZT single crystal. We find that the surfaces behave differently after etching. Values for surface recombination rates for [111]A and [111]B surfaces can vary by up to two orders of magnitudes for the same etchant. This large variation in surface recombination rates affects the charge collection efficiency and detector performance. We report surface treatments that enhance the charge collection efficiency for [111]A and [111]B surfaces. Data describing the detector response for Am/sup 241/ spectra current-voltage relationship, and bulk /spl mu//spl tau/ values and surface recombination rates are shown for different etchants.
机译:我们报告了不同蚀刻剂对碲化镉锌(CZT)的迁移率-寿命产品(/ spl mu // spl tau /)的影响。 / spl mu // spl tau /值是通过Hecht关系获得的。还使用光电导率测量研究了表面重组的影响。获得了{111}取向的CZT单晶的结果。我们发现,蚀刻后表面的行为有所不同。对于相同的蚀刻剂,[111] A和[111] B表面的表面复合率值可以变化两个数量级。表面复合率的这种大变化会影响电荷收集效率和检测器性能。我们报道了可提高[111] A和[111] B表面电荷收集效率的表面处理。示出了描述Am / sup 241 /光谱电流-电压关系的检测器响应的数据,以及不同蚀刻剂的体/ spl mu // spl tau /值和表面复合率。

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