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A Physics-Based Engineering Methodology for Calculating Soft Error Rates of Bulk CMOS and SiGe Heterojunction Bipolar Transistor Integrated Circuits

机译:一种基于物理的工程方法,用于计算块状CMOS和SiGe异质结双极晶体管集成电路的软错误率

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摘要

This paper describes a new methodology for characterizing the electrical behavior and soft error rate (SER) of CMOS and SiGe HBT integrated circuits that are struck by ions. A typical engineering design problem is to calculate the SER of a critical path that commonly includes several circuits such as an input buffer, several logic gates, logic storage, clock tree circuitry, and an output buffer. Using multiple 3D TCAD simulations to solve this problem is too costly and time-consuming for general engineering use. The new and simple methodology handles the problem with ease by simple SPICE simulations. The methodology accurately predicts the measured threshold linear energy transfer (LET) of a bulk CMOS SRAM. It solves for circuit currents and voltage spikes that are close to those predicted by expensive 3D TCAD simulations. It accurately predicts the measured event cross-section vs. LET curve of an experimental SiGe HBT flip-flop. The experimental cross section vs. frequency behavior and other subtle effects are also accurately predicted.
机译:本文介绍了一种新的方法,用于表征被离子撞击的CMOS和SiGe HBT集成电路的电性能和软错误率(SER)。一个典型的工程设计问题是计算一条关键路径的SER,该路径通常包括几个电路,例如输入缓冲器,几个逻辑门,逻辑存储器,时钟树电路和输出缓冲器。对于常规工程而言,使用多个3D TCAD仿真来解决此问题既费钱又费时。通过简单的SPICE仿真,新的简单方法轻松解决了该问题。该方法可准确预测块状CMOS SRAM的测量阈值线性能量转移(LET)。它可以解决与昂贵的3D TCAD仿真所预测的接近的电路电流和电压尖峰。它可以准确预测实验性SiGe HBT触发器的事件横截面与LET曲线。还可以准确预测实验截面与频率的关系以及其他细微的影响。

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