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机译:X射线和质子辐射对40 nm CMOS物理上不可克隆的功能器件的影响
Department of Electrical Engineering and Computer Science, Vanderbilt University, Nashville, TN, USA;
Department of Electrical Engineering and Computer Science, Vanderbilt University, Nashville, TN, USA;
imec, Leuven, Belgium;
Department of Electrical Engineering and Computer Science, Vanderbilt University, Nashville, TN, USA;
Department of Electrical Engineering and Computer Science, Vanderbilt University, Nashville, TN, USA;
Department of Electrical Engineering and Computer Science, Vanderbilt University, Nashville, TN, USA;
Department of Electrical Engineering and Computer Science, Vanderbilt University, Nashville, TN, USA;
Department of Electrical Engineering and Computer Science, Vanderbilt University, Nashville, TN, USA;
Department of Electrical Engineering and Computer Science, Vanderbilt University, Nashville, TN, USA;
imec-COSIC, KU Leuven, Leuven, Belgium;
imec, Leuven, Belgium;
imec, Leuven, Belgium;
Department of Electrical Engineering and Computer Science, Vanderbilt University, Nashville, TN, USA;
Department of Electrical Engineering and Computer Science, Vanderbilt University, Nashville, TN, USA;
Department of Electrical Engineering and Computer Science, Vanderbilt University, Nashville, TN, USA;
Protons; Electric breakdown; Radiation effects; Logic gates; Annealing; Leakage currents; Transistors;
机译:使用软氧化物击穿的物理上无法克隆的功能,具有40%CMOS中的0%原始BER和51.8 fJ / bit
机译:215平方米的双稳态物理不可渗透功能,ACF为<0.005,目的位不稳定为2.05%,在65-NM CMOS过程中
机译:全数字统一物理上不可克隆的功能和真正的随机数发生器,具有在14nm三栅CMOS中自校准分层冯·诺伊曼提取的功能
机译:在40nm CMOS中使用软氧化物击穿,具有0%BER的物理上无法克隆的功能
机译:亚阈值区域中基于Mosfets分压器阵列的物理上不可克隆的函数
机译:基于SRAM物理上不可克隆的功能的移动设备上的受信任相机
机译:X射线和质子辐射效应40nm CMOS物理不可渗透功能装置