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首页> 外文期刊>Nanotechnology, IEEE Transactions on >Localized Growth of Carbon Nanotubes on CMOS Substrate at Room Temperature Using Maskless Post-CMOS Processing
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Localized Growth of Carbon Nanotubes on CMOS Substrate at Room Temperature Using Maskless Post-CMOS Processing

机译:使用无掩模后CMOS工艺在室温下在CMOS基板上局部生长碳纳米管

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摘要

Carbon nanotubes (CNTs) have been successfully synthesized on foundry CMOS substrate using maskless post-CMOS surface micromachining and localized heating techniques. The integrated heater is directly made of gate polysilicon and suspended over a micromachined cavity for thermal isolation. The synthesized CNTs are connected to CMOS interconnect metal layers without the need of any metal deposition. It is experimentally verified that the electrical properties of the neighboring CMOS transistors are unchanged after CNT growth.
机译:碳纳米管(CNTs)已成功地使用无掩模后CMOS表面微加工和局部加热技术在铸造CMOS基板上合成。集成加热器直接由栅极多晶硅制成,并悬在微机械腔体上以进行热隔离。不需要任何金属沉积,将合成的CNT连接到CMOS互连金属层。实验证明,CNT生长后,相邻的CMOS晶体管的电性能没有变化。

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