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首页> 外文期刊>Nanotechnology, IEEE Transactions on >Fabrication of Moth-Eye Nanostructure Arrays Using Roll-to-Roll UV-Nanoimprint Lithography With an Anodic Aluminum Oxide Mold
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Fabrication of Moth-Eye Nanostructure Arrays Using Roll-to-Roll UV-Nanoimprint Lithography With an Anodic Aluminum Oxide Mold

机译:使用卷到卷的UV-纳米压印光刻技术和阳极氧化铝模具制作蛾眼纳米结构阵列

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摘要

Broadband antireflection is essential for improving the photocurrent generation of photovoltaic modules or the enhancement of visibility in optical devices. The moth-eye nanostructure is one of the most promising structures with potential for commercialization in the near future and roll-to-roll ultraviolet nanoimprint lithography (R2R UV-NIL) technique provides a solution for the commercialization due to its high speed, large area, high resolution, and high throughput. In this study, the anodic aluminum oxide (AAO) mold is used to produce the moth-eye nanostructure arrays upon a flexible polyethylene terephthalate substrate combining with R2R UV-NIL process, which provides a solution for continuous production of moth-eye nanostructure arrays cheaply. In addition, the influence of mold parameters and process parameters on the forming quality were investigated, respectively. The influence of process parameters was investigated by using the one-variable-at-a-time method, including feeding speed, imprinting pressure, and mold temperature. The qualitative and quantitative height evaluation for the moth-eye nanostructure arrays were carried out based on the atomic force microscope images. As a result, the feasibility is verified to produce moth-eye nanostructure arrays continuously with AAO mold and R2R UV-NIL technique. A rapid feeding speed of 20 m/min was possible to produce good moth-eye nanostructure arrays with mold 1, which were 300 nm in diameter, 300 nm in height. However, different forming results were observed as the mold parameters decreased including unsatisfactory demolding phenomenon and incomplete filling phenomenon. The incomplete filling phenomenon was improved to a certain extent by changing the process parameters and higher forming height was accomplished with lower feeding speed, higher imprinting pressure, and higher mold temperature. This research is beneficial to provide a direction for the industrial production of the- moth-eye nanostructure arrays.
机译:宽带减反射对于改善光伏模块的光电流生成或增强光学设备的可见性至关重要。蛾眼纳米结构是最有希望在不久的将来实现商业化的结构之一,而卷对卷紫外纳米压印光刻技术(R2R UV-NIL)由于其高速,大面积的应用而为商业化提供了解决方案,高分辨率和高吞吐量。在这项研究中,阳极氧化铝(AAO)模具用于在柔性聚对苯二甲酸乙二醇酯基板上结合R2R UV-NIL工艺生产蛾眼纳米结构阵列,从而为廉价连续生产蛾眼纳米结构阵列提供了解决方案。此外,分别研究了模具参数和工艺参数对成形质量的影响。使用一次可变的方法研究了工艺参数的影响,包括进料速度,压印压力和模具温度。基于原子力显微镜图像对蛾眼纳米结构阵列进行了定性和定量的高度评估。结果,验证了用AAO模具和R2R UV-NIL技术连续生产蛾眼纳米结构阵列的可行性。以20 m / min的快速进料速度可以用模具1产生良好的蛾眼纳米结构阵列,直径为300 nm,高度为300 nm。然而,随着模具参数的降低,观察到了不同的成型结果,包括不满意的脱模现象和不完全填充现象。通过改变工艺参数,在一定程度上改善了不完全填充现象,并以较低的进给速度,较高的压印压力和较高的模具温度实现了较高的成型高度。该研究有益于为蛾眼纳米结构阵列的工业生产提供方向。

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