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A Simple Four-Port Parasitic Deembedding Methodology for High-Frequency Scattering Parameter and Noise Characterization of SiGe HBTs

机译:SiGe HBT的高频散射参数和噪声表征的简单四端口寄生去嵌入方法

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摘要

A new four-port scattering parameter (S-parameter) and broad-band noise deembedding methodology is presented. This deembedding technique considers distributed on-wafer parasitics in the millimeter-wave band (f>30 GHz). The procedure is based on simple analytical calculations and requires no equivalent circuit modeling or electromagnetic simulations. Detailed four-port system analysis and deembedding expressions are derived. Comparisons between this new method and the industry-standard "open-short" method were made using measured and simulated data on state-of-the-art SiGe HBTs with a maximum cutoff frequency of approximately 180 GHz. The comparison demonstrates that better accuracy is achieved using this new four-port method. Based on a combination of measurements and HP-ADS simulations, we also show that this new technique can be used to accurately extract the S-parameters and broad-band noise characteristics to frequencies above 100 GHz.
机译:提出了一种新的四端口散射参数(S参数)和宽带噪声去嵌入方法。这种去嵌入技术考虑了毫米波波段(f> 30 GHz)中的分布式晶圆上寄生效应。该程序基于简单的分析计算,不需要等效的电路建模或电磁仿真。推导了详细的四端口系统分析和去嵌入表达式。使用最新的SiGe HBT的最大截止频率约为180 GHz的测量数据和模拟数据,对该新方法与行业标准“开放式短路”方法进行了比较。比较表明,使用这种新的四端口方法可以实现更高的精度。基于测量和HP-ADS仿真的结合,我们还表明,这项新技术可用于将S参数和宽带噪声特性准确地提取到100 GHz以上的频率。

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