首页> 外文期刊>IEEE Transactions on Microwave Theory and Techniques >Two-layer dielectric microstrip line structure: SiO/sub 2/ on Si and GaAs on Si: modeling and measurement
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Two-layer dielectric microstrip line structure: SiO/sub 2/ on Si and GaAs on Si: modeling and measurement

机译:两层介质微带线结构:Si上的SiO / sub 2 /和Si上的GaAs:建模和测量

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摘要

Further development is reported of the modeling of the two-layer dielectric microstrip line structure by computing the scattering parameter S/sub 21/ derived from the model and comparing the computed value with the measured value over the frequency range from 90 MHz to 18 GHz. The sensitivity of the phase of S/sub 21/, and the magnitude of the characteristic impedance to various parameters of the equivalent circuit is also discussed. Examples are given of the measurement and modeling of the SiO/sub 2/ on silicon system to 18 GHz and the modeling of the GaAs on silicon system to 100 GHz.
机译:通过计算从模型得出的散射参数S / sub 21 /并将计算值与90 MHz至18 GHz频率范围内的测量值进行比较,报告了对两层介质微带线结构建模的进一步发展。还讨论了S / sub 21 /相位的灵敏度以及特性阻抗对等效电路各种参数的大小。给出了在18 GHz的硅系统上SiO / sub 2 /的测量和建模,以及在100 GHz的硅系统上GaAs的测量和建模的示例。

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