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Investigation and modeling of impact ionization with regard to the RF and noise behavior of HFET

机译:关于HFET的RF和噪声行为的碰撞电离的研究和建模

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摘要

A new small-signal and noise-equivalent circuit for heterostructure field-effect transistors (HFET's), including the influence of impact-ionization and gate-leakage current on the electronic properties, is presented. The capability of the new model is demonstrated by bias-dependent investigations of the high-frequency (HF) (45 MHz up to 40 GHz) and noise behavior (2 GHz up to 18 GHz) of the InAlAs/InGaAs/InP HFET. Furthermore, based on these results, the bias-dependence of the newly implemented small-signal equivalent elements and the equivalent intrinsic noise sources, are discussed.
机译:提出了一种新的用于异质结构场效应晶体管(HFET)的小信号和等效噪声电路,包括碰撞电离和栅极泄漏电流对电子特性的影响。通过对InAlAs / InGaAs / InP HFET的高频(HF)(高达40 GHz的45 MHz)和噪声行为(高达18 GHz的2 GHz)进行偏倚研究,证明了新模型的功能。此外,基于这些结果,讨论了新实现的小信号等效元件和等效固有噪声源的偏置相关性。

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