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Temperature-dependent small-signal and noise parameter measurements and modeling on InP HEMTs

机译:InP HEMT上与温度相关的小信号和噪声参数测量和建模

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摘要

In this paper, we present detailed on-wafer S-parameter and noise parameter measurements and modeling of ZnP/InAlAs/InGaAs high electron mobility transistors (0.1-/spl mu/m gate length) at cryogenic temperatures. Various physical effects influencing small-signal parameters, especially the radio-frequency (RF) transconductance and RF output resistance and their temperature dependence, are discussed in detail. Accurate on-wafer noise parameter measurements are carried out from 300 to 18 K, and the variation of the equivalent noise temperatures of drain and source (T/sub d/ and T/sub g/) are modeled against temperature. Based on these models, a cryogenic low-noise amplifier in the K/spl alpha/-band is developed with a record low noise temperature of 10 K.
机译:在本文中,我们介绍了低温下ZnP / InAlAs / InGaAs高电子迁移率晶体管(栅极长度为0.1- / spl mu / m)的详细的晶圆上S参数和噪声参数测量以及建模。详细讨论了影响小信号参数的各种物理效应,尤其是射频(RF)跨导和RF输出电阻及其温度依赖性。在300至18 K范围内进行准确的晶圆上噪声参数测量,并根据温度对漏极和源极的等效噪声温度(T / sub d /和T / sub g /)的变化进行建模。基于这些模型,开发了K / spl alpha /波段的低温低噪声放大器,其低噪声温度达到了创纪录的10K。

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