首页> 外文期刊>IEEE Transactions on Microwave Theory and Techniques >Geometry-Dependent Quality Factors in ${hbox{Ba}}_{0.5}{hbox{Sr}}_{0.5}{hbox{TiO}}_{3}$ Parallel-Plate Capacitors
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Geometry-Dependent Quality Factors in ${hbox{Ba}}_{0.5}{hbox{Sr}}_{0.5}{hbox{TiO}}_{3}$ Parallel-Plate Capacitors

机译:$ {hbox {Ba}} _ {0.5} {hbox {Sr}} _ {0.5} {hbox {TiO}} _ {3} $平行板电容器中与几何有关的品质因数

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摘要

Quality factor variation with top electrode area in thin-film barium-strontium-titanate parallel-plate capacitors is discussed. At low frequencies, the geometry dependence is consistent with the presence of a parallel parasitic loss pathway enabled by conduction over the device mesa surface. At high frequencies, the variation in the quality factor with top electrode area is due to a geometry-independent series resistance
机译:讨论了钛酸钡锶钛酸盐平行板电容器的质量因数随上电极面积的变化。在低频下,几何形状依赖性与器件台面表面上的传导使能的平行寄生损耗路径一致。在高频下,品质因数随顶部电极面积的变化归因于与几何形状无关的串联电阻

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