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Compact Wideband Equivalent-Circuit Model for Electrical Modeling of Through-Silicon Via

机译:硅通孔电气建模的紧凑型宽带等效电路模型

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摘要

This paper presents a compact wideband equivalent-circuit model for electrical modeling of through-silicon vias (TSVs) in 3-D stacked integrated circuits and packaging. Rigorous closed-form formulas for the resistance and inductance of TSVs are derived from the magneto-quasi-static theory with a Fourier–Bessel expansion approach, whereas analytical formulas from static solutions are used to compute the capacitance and conductance. The equivalent-circuit model can capture the important parasitic effects of TSVs, including the skin effect, proximity effect, lossy effect of silicon, and semiconductor effect. Therefore, it yields accurate results comparable to those with 3-D full-wave solvers.
机译:本文提出了一种紧凑的宽带等效电路模型,用于在3D堆叠集成电路和封装中对硅通孔(TSV)进行电气建模。 TSV的电阻和电感的严格的封闭形式公式是使用傅立叶-贝塞尔展开方法从磁准静态理论得出的,而静态溶液的解析公式用于计算电容和电导。等效电路模型可以捕获TSV的重要寄生效应,包括趋肤效应,邻近效应,硅的损耗效应和半导体效应。因此,它产生的精确结果可与3-D全波求解器相媲美。

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