机译:考虑工作条件下陷阱引起的降解的RF GaN开关的表征和建模
Department of Electrical, Electronic, and Information Engineering, University of Bologna, Bologna, Italy;
Department of Electrical, Electronic, and Information Engineering, University of Bologna, Bologna, Italy;
Department of Electrical, Electronic, and Information Engineering, University of Bologna, Bologna, Italy;
Radio frequency; Temperature measurement; Gallium nitride; Logic gates; Voltage measurement; Performance evaluation; Degradation;
机译:关于AlGaN / GaN HEMT中陷阱引起的雪崩不稳定性和安全工作区问题的初步观察
机译:GaN-on-Si功率MISHEMT中深陷阱引起的动态导通电阻降低
机译:具有深亚微米栅极长度的GaN无结三栅极场效应晶体管:RF机制中的表征和建模
机译:在工作环境下对RF GaN开关陷阱引起的插入损耗的评估
机译:GaN电源开关的建模
机译:江西南部稀土元素尾矿中具有突出的氨氮降解能力的真菌伯克霍尔德菌Gan-35的分离与表征
机译:晶圆上表征设置,用于模型提取和验证大功率GaN HEMT开关