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Focused MOKE Study of Self-Assembly Nanoscale Fe$_{64}$ Ni$_{36}$ Dot Arrays

机译:自组装纳米级Fe $ _ {64} $ Ni $ _ {36} $点阵列的聚焦MOKE研究

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摘要

Using nanosphere lithography (NSL) technique, we have fabricated well defined triangular shaped Fe$_{64}$ Ni$_{36}$ dot arrays with feature size down to 30 nm on silicon substrate. In-plane focused magneto-optical Kerr effect (MOKE) measurements show that these nanoscale dot arrays have an enhanced coercivity of around 200 Oe compared with that of the continuous thin film of 50 Oe. In combining with micromagnetic calculations, we found that the magnetization process follows two steps, the rotation of the top corner and then a switching of the bottom base, which controls the coercivity of the dots.
机译:使用纳米球刻蚀(NSL)技术,我们在硅衬底上制造了轮廓清晰的三角形Fe $ _ {64} $ Ni $ _ {36} $点阵列,其特征尺寸低至30 nm。面内聚焦磁光克尔效应(MOKE)测量表明,与连续薄膜50 Oe相比,这些纳米级点阵列的矫顽力约为200 Oe。结合微磁计算,我们发现磁化过程遵循两个步骤,即顶角的旋转和底基的切换,这控制了点的矫顽力。

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