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首页> 外文期刊>IEEE Transactions on Magnetics >Skin Effect Suppressed Ni–Fe/Cu Electroplated Multilayer Wiring for High Data-Rate and Low Delay-Time I/O Interface Board
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Skin Effect Suppressed Ni–Fe/Cu Electroplated Multilayer Wiring for High Data-Rate and Low Delay-Time I/O Interface Board

机译:趋肤效应抑制了Ni-Fe / Cu电镀多层布线,以实现高数据速率和低延迟时间的I / O接口板

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摘要

Application of negative permeability beyond ferromagnetic resonance frequency is discussed in this paper. Targeted application is the skin effect suppression technology for long wiring on high-speed and low-delay I/O board. An 11.9 μ-thick Ni-Fe/Cu multilayer consisting of 0.25 μ-thick Ni-Fe and 0.51 μ-thick Cu in turn was electroplated, patterned into 609 μ-wide and 40 mm-long signal line of microstrip line (MSL) on a 250 μ-thick printed circuit board. Targeted frequency was 15 GHz, where relative real part permeability was supposed to be -2. The 40 mm-long Ni-Fe/Cu multilayer exhibited the insertion as small as 0.7 dB up to 25 GHz, which is almost the same as the copper monolayer MSL of the same geometry.
机译:本文讨论了铁磁谐振频率以外的负磁导率的应用。目标应用是在高速低延迟I / O板上实现长接线的趋肤效应抑制技术。依次电镀11.9μ厚的Ni-Fe / Cu多层膜,依次由0.25μ厚的Ni-Fe和0.51μ厚的Cu组成,图案化为609μm宽和40 mm长的微带线(MSL)信号线在250μ厚的印刷电路板上。目标频率为15 GHz,相对实部磁导率应为-2。 40 mm长的Ni-Fe / Cu多层膜在高达25 GHz的频率下显示的插入小至0.7 dB,这几乎与相同几何形状的铜单层MSL相同。

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