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Magnetic, Electrical Properties, and Structure of Cr-AlN and Mn-AlN Thin Films Grown on Si Substrates

机译:Si衬底上生长的Cr-AlN和Mn-AlN薄膜的磁性,电学性质和结构

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摘要

We have studied magnetic, electrical properties, and structure of Cr-AIN and Mn-AIN thin films grown on the Si substrates. Each magnetic state in Alo.esCro.orN and Al{sub}0.93Mn{sub}0.09N thin films changes from a paramagnetic state to a superparamagnetic state as temperature decreases. Room temperature (RT) ferromagnetism cannot be observed in each thin film. Each electrical property in Al{sub}0.93Mn{sub}0.07N and Al{sub}0.93Mn{sub}0.09N thin films becomes semiconducting, since the electrical resistivities of these thin films are higher than 10{sup}7μΩ·cm at RT. At 77 K, tunneling phenomena for the Al{sub}0.93Mn{sub}0.07N thin film and rectification for the Al{sub}0.93Mn{sub}0.09N thin film can be observed. Furthermore, the crystal structure in each thin film is also a poly crystalline structure with the preferential orientation of hcp (0001).
机译:我们研究了在硅衬底上生长的Cr-AIN和Mn-AIN薄膜的磁,电性能和结构。随着温度降低,Al esCro.orN和Al {sub} 0.93Mn {sub} 0.09N薄膜中的每个磁态都从顺磁态变为超顺磁态。不能在每个薄膜中观察到室温(RT)铁磁性。 Al {sub} 0.93Mn {sub} 0.07N和Al {sub} 0.93Mn {sub} 0.09N薄膜中的每个电特性都变为半导体,因为这些薄膜的电阻率高于10 {sup}7μΩ·cm在RT。在77 K下,可以观察到Al {sub} 0.93Mn {sub} 0.07N薄膜的隧穿现象和Al {sub} 0.93Mn {sub} 0.09N薄膜的整流。此外,每个薄膜中的晶体结构也是具有优先取向hcp(0001)的多晶结构。

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