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An O(n log m) algorithm for VLSI design rule checking

机译:用于VLSI设计规则检查的O(n log m)算法

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摘要

The authors describe a new variant of the segment tree approach for VLSI design rule checking. The best known algorithms to date for flat VLSI design rule checking require O(n log n) expected time and O( square root n) space, where n is the total number of edges on a mask layer of the chip. The expectation is with respect to a uniform distribution of edges over the chip area. The authors present a new algorithm of O(n log m) expected time complexity, where m is the maximum feature size for a given mask layer. Since m is bounded by the height of a chip, i.e. m=O( square root n), the new algorithm is adaptively more efficient than O(n log n). For layers such as diffusion or contact windows where m is independent of the chip size, i.e. m=O(1), the new algorithm runs in O(n) expected time, a definite improvement. The improved time efficiency is achieved without sacrificing O( square root n) space complexity.
机译:作者介绍了用于VLSI设计规则检查的段树方法的新变体。迄今为止,用于平面VLSI设计规则检查的最著名算法需要O(n log n)个预期时间和O(平方根n)个空间,其中n是芯片的掩模层上的边缘总数。期望是关于芯片区域上的边缘的均匀分布。作者提出了O(n log m)期望时间复杂度的新算法,其中m是给定掩模层的最大特征尺寸。由于m受芯片高度限制,即m = O(平方根n),因此新算法比O(n log n)适应性更高。对于扩散或接触窗这样的层,其中m与芯片尺寸无关,即m = O(1),新算法在O(n)预期时间内运行,这是一个明显的改进。在不牺牲O(平方根n)空间复杂度的情况下实现了提高的时间效率。

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