Inclusion of Chemical-Mechanical Polishing Variation in Statistical Static Timing Analysis

摘要

Technology trends show the importance of modeling process variation in static timing analysis. With the advent of statistical static timing analysis (SSTA), multiple independent sources of variation can be modeled. This paper proposes a methodology for modeling metal interconnect process variation in SSTA. The developed methodology is applied in this study to investigate metal variation in SSTA resulting from chemical-mechanical polishing (CMP). Using our statistical methodology, we show that CMP variation has a smaller impact on chip performance as compared to other factors impacting metal process variation.