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首页> 外文期刊>IEEE Photonics Technology Letters >Direct characterization of ultraviolet-light-induced refractive index structures by scanning near-field optical microscopy
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Direct characterization of ultraviolet-light-induced refractive index structures by scanning near-field optical microscopy

机译:通过扫描近场光学显微镜直接表征紫外光诱导的折射率结构

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摘要

We have applied a reflection scanning near-field optical microscope to directly probe ultraviolet (UV)-light-induced refractive index structures in planar glass samples. This technique permits direct comparison between topography and refractive index changes (10/sup -5/-10/sup -3/) with submicrometer lateral resolution. The proposed method yields detailed information about the topography and index profiles of UV-written waveguides.
机译:我们已应用反射扫描近场光学显微镜直接探测平板玻璃样品中紫外线(UV)诱导的折射率结构。该技术允许以亚微米横向分辨率直接比较形貌和折射率变化(10 / sup -5 / -10 / sup -3 /)。拟议的方法产生有关紫外线写入波导的形貌和折射率分布的详细信息。

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