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首页> 外文期刊>IEEE Photonics Technology Letters >Improvement of InGaN-GaN light-emitting diodes with surface-textured indium-tin-oxide transparent ohmic contacts
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Improvement of InGaN-GaN light-emitting diodes with surface-textured indium-tin-oxide transparent ohmic contacts

机译:具有表面纹理化的铟锡氧化物透明欧姆接触的InGaN-GaN发光二极管的改进

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摘要

Presents a surface-textured indium-tin-oxide (ITO) transparent ohmic contact layer on p-GaN to increase the optical output of nitride-based light-emitting diodes (LED) without destroying the p-GaN. The surface-textured ITO layer was prepared by lithography and dry etching, and dimensions of the regular pattern were approximately 3 /spl times/ 3 /spl mu/m. The operating voltage of the surface-textured LED was almost the same as that of the typical planar LED since the ITO layer was in ohmic contact with the p-GaN. The experimental results indicate that the surface-textured ITO layer is suitable for fabricating high-brightness GaN-based light emitting devices.
机译:在p-GaN上提供了表面纹理化的铟锡氧化物(ITO)透明欧姆接触层,以增加基于氮化物的发光二极管(LED)的光输出,而不会破坏p-GaN。通过光刻和干法蚀刻制备具有表面纹理的ITO层,规则图案的尺寸为约3 / spl倍/ 3 /splμm/ m。由于ITO层与p-GaN欧姆接触,因此表面纹理化LED的工作电压与典型的平面LED几乎相同。实验结果表明,表面纹理化的ITO层适用于制造高亮度GaN基发光器件。

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