Million-$Q$ Reflection-Based Integrated Resonators Patterned With Deep Ultraviolet Photolithography

摘要

We describe million-Q one- and two-dimensional integrated reflective resonators based on ultralow-loss etched Bragg reflectors patterned on silica-on-silicon slab and channel waveguides using deep ultraviolet photoreduction lithography. Measured device performance, obtained in the limit of high reflectivity, provides insights in loss mechanisms operative in the subject systems. Implementation of integrated reflection-based resonators with high-Q and finesse values promises new directions in photonic integration with applications in sensing, filtering, and signal transport