首页> 外文期刊>IEEE Microwave and Guided Wave Letters >Ultra low-noise performance of 0.15-micron gate GaAs MESFET's made by direct ion implantation for low-cost MMIC's applications
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Ultra low-noise performance of 0.15-micron gate GaAs MESFET's made by direct ion implantation for low-cost MMIC's applications

机译:通过直接离子注入制造的0.15微米栅极GaAs MESFET具有超低噪声性能,适用于低成本MMIC应用

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摘要

The high-speed and noise performance of 0.15- mu m gate GaAs MESFETs for microwave and millimeter-wave IC applications is reported. The best extrinsic f/sub t/ is 109 GHz without correction for pad parasitics, which is equivalent to an intrinsic f/sub t/ of 134 GHz. The 0.15- mu m*200- mu gate GaAs MESFET achieved a 0.6-dB noise figure with a 17-dB associated gain at 10 GHz and a 0.9-dB noise figure with a 13-dB associated gain at 18 GHz. The measured noise figure and associated gain are the best reported for GaAs MESFETs and are comparable to the best noise/gain performance of HEMTs and P-HEMTs.
机译:据报道,用于微波和毫米波IC应用的0.15μm栅极GaAs MESFET的高速和噪声性能。最好的外部f / sub t /是109 GHz,未经焊盘寄生校正,这等效于134 GHz的固有f / sub t /。 0.15μm*200μg的栅极GaAs MESFET在10 GHz时具有0.6dB的噪声系数和17dB的相关增益,在18 GHz时具有0.9dB的噪声系数和13dB的相关增益。对于GaAs MESFET,测得的噪声系数和相关增益是最好的,并且可以与HEMT和P-HEMT的最佳噪声/增益性能相比。

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