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首页> 外文期刊>IEEE Microwave and Guided Wave Letters >Microwave performance of low-power ion-implanted 0.25-micron gate GaAs MESFET for low-cost MMIC's applications
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Microwave performance of low-power ion-implanted 0.25-micron gate GaAs MESFET for low-cost MMIC's applications

机译:适用于低成本MMIC应用的低功率离子注入0.25微米栅极GaAs MESFET的微波性能

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Low-power microwave performance of an enhancement mode) (E-mode ion-implanted GaAs MESFET is reported. The 0.25- mu m*100- mu m E-MESFET has a threshold voltage of V/sub th/=0.0 V. At 1.0-mW operation of power with a bias condition of V/sub ds/=0.5 V and I/sub ds/-2 mA, a noise figure of 0.85 dB with an associated gain of 15 dB was measured at 4 GHz. These results demonstrate that the GaAs E-MESFET is an excellent choice for low-power personal communication applications.
机译:报道了增强模式的低功率微波性能)(E模式离子注入GaAsMESFET。0.25-μm*100-μmE-MESFET的阈值电压为V / sub th / = 0.0V。在偏置条件为V / sub ds / = 0.5 V和I / sub ds / -2 mA的条件下,以1.0mW的功率工作,在4 GHz下测得的噪声系数为0.85 dB,相关增益为15 dB。证明GaAs E-MESFET是低功耗个人通信应用的绝佳选择。

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