A 90-nm Low-Power 32-kB Embedded SRAM With Gate Leakage Suppression Circuit for Mobile Applications

摘要

In sub-100-nm generation, gate-tunneling leakage current increases and dominates the total standby leakage current of LSIs based on decreasing gate-oxide thickness. Showing that the gate leakage current is effectively reduced by lowering the gate voltage, we propose a local dc level control (LDLC) for SRAM cell arrays and an automatic gate leakage suppression driver (AGLSD) for peripheral circuits. We designed and fabricated a 32-kB 1-port SRAM using 90-nm CMOS technology. The six-transistor SRAM cell size is 1.25 μm{sup}2. Evaluation shows that the standby current of 32-kB SRAM is 1.2 μA at 1.2 V and room temperature. It is reduced to 7.5% of conventional SRAM.