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A long pulse discharge excited ArF laser

机译:长脉冲放电激发ArF激光器

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An X-ray preionised, discharge excited ArF excimer laser,nΛ=193 nm, has been studied in the long pulse regime. The lasernperformance is found to be primarily dependent on the dischargenstability, and therefore, on the gas composition, preionization timingnand the pumping power. Using X-ray preionization and prepulse-mainpulsenexcitation, laser pulselengths of up to 120-ns full-width atnhalf-maximum at 4 mJ/l are obtained by decreasing the partial pressuresnof the active ingredients, F2 and Ar, and using Ne as anbuffer gas. This is almost six times as long as usual for dischargenexcited ArF lasers
机译:在长脉冲状态下研究了X射线预离子化,放电激发的ArF准分子激光器,n = 193 nm。发现激光性能主要取决于放电稳定性,因此取决于气体成分,预电离定时和泵浦功率。使用X射线预电离和预脉冲主脉冲激发,通过降低活性成分F2和Ar的分压n并使用Ne作为缓冲气体,可获得最大120 ns的半峰全宽最大4ns的激光脉冲长度。这几乎是放电后的ArF激光器的六倍

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