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首页> 外文期刊>IEEE journal of selected topics in quantum electronics >Polarization performance analysis of etched diffraction grating demultiplexer using boundary element method
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Polarization performance analysis of etched diffraction grating demultiplexer using boundary element method

机译:蚀刻衍射光栅解复用器偏振特性的边界元分析

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摘要

The polarization-dependent characteristics of an etched diffraction grating demultiplexer are analyzed using the boundary element method. Comparisons are made between an echelle grating coated with a metal and a dielectric grating with retro-reflecting facets. The results indicate that an echelle grating coated with a metal can be approximated as a grating with a perfectly conducting surface. A retro-reflecting-facet grating based on a high index material has a lower polarization dependent loss (PDL), while the other performances are similar to an echelle grating coated with a metal. It is also shown that by titling the shaded facets appropriately the overall PDL performance can be improved when the total number of used channels is not too large. The influence of the surface roughness of the shaded facets on the PDL of the device is also investigated for all wavelength channels.
机译:使用边界元方法分析了蚀刻衍射光栅解复用器的偏振相关特性。在涂有金属的阶梯光栅和具有逆反射小平面的介电光栅之间进行比较。结果表明,涂​​有金属的阶梯光栅可以近似为具有完美导电表面的光栅。基于高折射率材料的后向反射刻面光栅具有较低的偏振相关损耗(PDL),而其他性能类似于涂有金属的阶梯形光栅。还显示出,当使用的通道总数不太大时,通过适当地对阴影小平面倾斜,可以提高总体PDL性能。对于所有波长通道,还研究了阴影面的表面粗糙度对设备PDL的影响。

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