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Frequency-Dependent Complex Conductivities and Dielectric Responses of Indium Tin Oxide Thin Films From the Visible to the Far-Infrared

机译:铟锡氧化物薄膜从可见光到远红外的随频率变化的复电导率和介电响应

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Transparent and conducting indium tin oxide (ITO) thin films form an integral part for various optoelectronic devices. In this paper, we report the frequency-dependent complex conductivities and dielectric responses of several sputtered ITO thin films with thicknesses in the range of 189-962 nm by using terahertz time domain spectroscopy (THz-TDS), optical reflectance spectroscopy, and electrical measurements. The plasma frequencies are verified to be from 1590 to 1930 rad·THz, while the scattering times are in the range 6-7 fs based on the Drude free-electron model. The mobilities of the above ITO thin films are calculated to be 32.7-34.2 cm2 V-1 s-1, whereas the carrier concentrations lie in the range 2.79-4.10× 1020 cm-3. The electrical properties derived from the THz-TDS technique agree well with those determined by Hall measurement. Parameters for the complex dielectric function suitable for ITO in the range 0.2-2 and 4-450 THz are also determined.
机译:透明且导电的铟锡氧化物(ITO)薄膜构成各种光电设备不可或缺的部分。在本文中,我们通过太赫兹时域光谱法(THz-TDS),光反射光谱法和电学测量报告了几种溅射的ITO薄膜的频率相关复电导率和介电响应,这些薄膜的厚度在189-962 nm之间。根据德鲁德自由电子模型,等离子体频率经验证为1590至1930 rad·THz,而散射时间在6-7 fs的范围内。上述ITO薄膜的迁移率经计算为32.7-34.2cm 2 V-1s-1,而载流子浓度在2.79-4.10×1020cm-3的范围内。从THz-TDS技术得出的电性能与通过霍尔测量确定的电性能非常吻合。还确定了适用于ITO的0.2-2和4-450 THz范围内的复介电函数参数。

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