Simulation-Based Study of MEMS X-Ray Optics for Microanalysis

摘要

A new type of X-ray optics system based on microelectromechanical systems technologies is proposed for microanalysis. Side walls of micro pores made by silicon dry etching or X-ray lithography are used as X-ray mirrors. Ray-tracing simulations are constructed to estimate the performance of a planar X-ray optics system made of silicon and nickel. From simulations, we conclude that, with this type of optics, a fine focus on the order of $ is possible and the intensity gain is 1000–7000 at ${rm Al}~{rm K}_{alpha}~1490~{rm eV}$, compared to the case without this optical system.