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首页> 外文期刊>IBM Journal of Research and Development >In situ surface pH measurement during electrolysis using a rotating pH electrode
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In situ surface pH measurement during electrolysis using a rotating pH electrode

机译:使用旋转pH电极进行电解过程中的原位表面pH测量

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An in situ technique has been developed for measuring the surface pH adjacent to a solid electrode/liquid interface during electrolysis. Measurements of the surface pH can be used to obtain insights regarding the electrodeposition of various transition metals and to obtain a better understanding of associated in situ surface chemistry effects. Many transition metals and alloys deposit with simultaneous hydrogen evolution and, as a result, are accompanied by a pH rise near the cathode, thereby affecting the reactivity of the nearby metal-ion species. Measurements of the surface pH of a solution containing simple salts during hydrogen evolution from a cathode were performed. The surface pH of a cathode during Ni and NiFe electrodeposition was also measured. The experiments demonstrated that, in the absence of buffers or metal ions, the surface pH rises many pH units above the bulk value. During Ni and NiFe electrodeposition, however, the surface pH of solutions consisting of simple salts and starting from a bulk pH level of 2 does not increase more than 3 pH units from the bulk value. In the case of Ni and NiFe electrodeposition, surface buffering occurs because of the hydrolysis of the metal-ion species present. Additionally, it is found that during the anomalous codeposition of NiFe, the surface pH is much lower than that required by the Dahms-Croll hypothesis.
机译:已经开发了用于在电解期间测量与固体电极/液体界面相邻的表面pH的原位技术。表面pH值的测量可用于获得有关各种过渡金属电沉积的见解,并更好地了解相关的原位表面化学作用。许多过渡金属和合金沉积时会同时析出氢,结果伴随着阴极附近的pH升高,从而影响附近金属离子的反应活性。在从阴极放出氢的过程中,对包含单盐的溶液的表面pH进行了测量。还测量了Ni和NiFe电沉积过程中阴极的表面pH。实验表明,在不存在缓冲剂或金属离子的情况下,表面pH值会比体积值高许多pH单位。但是,在Ni和NiFe电沉积过程中,由简单盐组成并从2的整体pH值开始的溶液的表面pH值相对于整体值增加的pH值不超过3。在镍和镍铁电沉积的情况下,由于存在的金属离子物质的水解而发生表面缓冲。另外,发现在NiFe的异常共沉积期间,表面pH远低于Dahms-Croll假说所要求的。

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