首页> 外文期刊>Fusion Engineering and Design >Study on the interaction between He and defects induced by He-ion irradiation in W and W5Re alloy
【24h】

Study on the interaction between He and defects induced by He-ion irradiation in W and W5Re alloy

机译:HE-ION照射在W和W5RE合金中诱导缺陷与缺陷的研究

获取原文
获取原文并翻译 | 示例
       

摘要

To investigate the interaction between He atom and irradiation-induced defects in W and W5Re, multiple energetic He ions with damage dose ranging from 0.84 dpa to 1.63 dpa were selected in the present study to implant into W and W5Re samples. Doppler broadening spectroscopy (DBS) and coincidence Doppler broaden spectroscopy (CDB) based on slow positron beam and synchrotron X-ray diffraction technology were employed in the current work. Under the same dose (= 1 x 10(21) ions m(-2)) irradiation at room temperature, the depth distribution of vacancy-type defects in W and W5Re is similar. With the increase of irradiation dose, the vacancy type defects in W continue to grow through absorbing and merging. However, Re atoms are more likely to hinder this growth mechanism, leading to an accumulation of high density but small size vacancy-type defects in W5Re. The HenVm complexes in W continuously attract the mobile interstitial He atom and then induce the trap mutation in the implanted region. Micro-voids and large He bubbles (similar to mu m) exceed the recognition of positron. Re atoms has strong the attraction to vacancies and positron affinity. The possible compound of Re and HenVm complexes makes it easier for positron to characterize the He-related and Re-related information around the defect sites. The lattice swelling is similar for the W and W5Re because the structure of HenVm cluster or He bubble can destroy the lattice periodicity and increase the lattice stress in the implanted region.
机译:为了探讨W和W2RE中的辐射和辐射诱导的缺陷之间的相互作用,在本研究中选择了具有0.84dPa至1.63dPa的损伤剂量的多个能量He离子,以植入W和W2样品。基于慢阳梁和同步X射线衍射技术的多普勒展宽光谱(DBS)和重合多普勒拓宽光谱(CDB)采用了当前的作用。在室温下照射在相同剂量(& = 1×10(21)离子m(-2))下,W和W2RE中空位型缺陷的深度分布是相似的。随着辐照剂量的增加,W中的空位型缺陷继续通过吸收和合并而生长。然而,重新原子更可能阻碍这种生长机制,导致高密度的积累,但在W5RE中的尺寸小的空位型缺陷。 W中的HENVM复合物连续吸引移动间质性的HE原子,然后在植入区域诱导陷阱突变。微空隙和大的他泡泡(类似于Mu M)超过了正电子的识别。 Re原子对空缺和正电子亲和力具有强大的吸引力。 RE和HENVM复合物的可能化合物使得正电子更容易,以表征缺陷站点周围的HE相关和重新相关信息。晶格肿胀类似于W和W2RE,因为Henvm簇的结构或泡沫的结构可以破坏晶格周期性并增加植入区域中的晶格应力。

著录项

  • 来源
    《Fusion Engineering and Design》 |2021年第1期|112118.1-112118.8|共8页
  • 作者单位

    Chinese Acad Sci Inst High Energy Phys Beijing 100049 Peoples R China|Univ Chinese Acad Sci Beijing 100039 Peoples R China;

    Chinese Acad Sci Inst High Energy Phys Beijing 100049 Peoples R China;

    Chinese Acad Sci Inst High Energy Phys Beijing 100049 Peoples R China;

    China Inst Atom Energy Beijing 102413 Peoples R China;

    Beihang Univ Beijing 100191 Peoples R China;

    Chinese Acad Sci Inst High Energy Phys Beijing 100049 Peoples R China;

    Chinese Acad Sci Inst High Energy Phys Beijing 100049 Peoples R China;

    Chinese Acad Sci Inst High Energy Phys Beijing 100049 Peoples R China;

    Chinese Acad Sci Inst High Energy Phys Beijing 100049 Peoples R China;

    Univ Helsinki POB 43 FI-00014 Helsinki Finland;

    Chinese Acad Sci Inst High Energy Phys Beijing 100049 Peoples R China|Univ Chinese Acad Sci Beijing 100039 Peoples R China;

    Chinese Acad Sci Inst High Energy Phys Beijing 100049 Peoples R China|Univ Chinese Acad Sci Beijing 100039 Peoples R China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    W; W5Re; He-ion irradiation; Vacancy-type defects; Positron annihilation spectroscopy; Grazing incidence X-ray diffraction;

    机译:W;W5RE;HE-ION辐照;空位型缺陷;正电子湮没光谱;放牧入射X射线衍射;

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号