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Removing W-contaminants in helium and neon RF plasma to maintain the optical performance of the ITER UWAVS first mirror

机译:去除氦和氖射频等离子体中的W污染物,以保持ITER UWAVS第一面镜的光学性能

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摘要

First metallic mirrors used in optical diagnostics such as the Upper Wide Angle Viewing System (UWAVS) in ITER may undergo contamination with beryllium and tungsten. Contamination levels of 10 nm can significantly degrade mirror performance. A UWAVS first mirror cleaning system prototype uses radio-frequency (RF) gas discharge to remove contaminants. Although tungsten is not expected to be a main contaminant, removing it with ion sputtering may become challenging due to the high atomic mass. Cleaning tests were focused on 10–20 nm tungsten layers removal from various substrates using a tailored RF circuit in He and Ne. W-coatings were also produced on an existing single-crystal (SC) Mo-mirror 105 mm diameter. He and Ne were chosen for many tests due to their effectiveness and suitability for ITER operations. Sputtering conditions were determined through ion energy measurements. Ion energies of 100–150 eV and currents of 0.5–0.8 A/m2were found to be optimum for 30–40 MHz RF discharges. The cleaning rate in He was 0.3–0.5 nm/hour for W-deposits. Etching rate of 1 nm/hour was observed for the Mo-mirror. No surface roughness degradation was determined with SEM and optical interferometry after mirror material was removed. Overall exposure time of the SC Mo-mirror was 100 h.
机译:光学诊断中使用的第一个金属镜(例如ITER中的上广角观察系统(UWAVS))可能会受到铍和钨的污染。 10µnm的污染水平会大大降低反射镜的性能。 UWAVS的第一个镜面清洁系统原型使用射频(RF)气体放电来去除污染物。尽管预计钨不是主要污染物,但由于原子量高,用离子溅射去除钨可能变得具有挑战性。清洁测试的重点是使用量身定制的He和Ne射频电路,从各种衬底上去除10-20 nm的钨层。在现有的直径为105SCmm的单晶(SC)Mo镜上也可以生产W涂层。由于他和Ne因其对ITER行动的有效性和适用性而被选择参加许多测试。通过离子能量测量确定溅射条件。对于30–40 MHz的RF放电,发现100-150 eV的离子能量和0.5-0.8 A / m2的电流是最佳的。钨沉积的He清洗速度为0.3-0.5 nm /小时。观察到Mo镜的蚀刻速率为1 nm /小时。去除镜面材料后,通过SEM和光学干涉法未确定表面粗糙度降低。 SC Mo镜的总曝光时间为100 h。

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