首页> 外文期刊>Frontiers of optoelectronics in China >Optimization of organic light emitting diode for HAT-CN based nano-structured device by study of injection characteristics at anode/organic interface
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Optimization of organic light emitting diode for HAT-CN based nano-structured device by study of injection characteristics at anode/organic interface

机译:通过研究阳极/有机界面处的注入特性,优化基于HAT-CN的纳米结构器件的有机发光二极管

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摘要

To increase the current density of the hole only device, 1, 4, 5, 8, 9, 11-hexaazatriphenylene-hexacarboni-trile (HAT-CN) material has been inserted in the device at the indium tin oxide (ITO)/organic interface. Since HAT-CN molecule can withdraw electrons, it can alter electronic properties of the electrodes and hence inserted between the organic/metal interfaces. This paper deals with the optimization of the thickness of organic-metal layers to enhance the efficiency. Also, efforts have been made to increase the current density and reduce the operating voltage of the device. The material 2, 7-bis [N, N-bis (4-methoxy-phenyl) amino]-9, 9-spirobifluorene (Meo-Spiro-TPD) is used to simulate the hole only device because it is a thermally stable hole transport material. Simulated results shows that better current density values can be achieved compared to fabricated one by optimizing the organic metal layer thickness. The best optimized layer thickness of 22 nm for Alq_3, 25 nm for CBP* doped with Ir(ppy)_3, 9 nm for Meo-Spiro TPD and 4 nm for HAT-CN which results in current density of 0.12 A/cm2 with a reduction in operating voltage by approximately 2 V.
机译:为了增加仅空穴器件的电流密度,已在铟锡氧化物(ITO)/有机硅中将1,4,4,5,8,9,11-六氮杂三苯并六羰基腈(HAT-CN)材料插入该器件中接口。由于HAT-CN分子可以吸收电子,因此它可以改变电极的电子性质,因此可以插入有机/金属界面之间。本文旨在优化有机金属层的厚度以提高效率。另外,已经努力增加电流密度并降低装置的工作电压。材料2,7-双[N,N-双(4-甲氧基-苯基)氨基] -9,9-螺双芴(Meo-Spiro-TPD)用于模拟仅孔装置,因为它是热稳定孔运输材料。仿真结果表明,通过优化有机金属层的厚度,与制造的电流密度值相比,可以获得更好的电流密度值。对于Alq_3,最佳优化层厚度为22 nm,对于掺杂Ir(ppy)_3的CBP *为25 nm,对于Meo-Spiro TPD为9 nm,对于HAT-CN为4 nm,这导致电流密度为0.12 A / cm2。工作电压降低约2 V.

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