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首页> 外文期刊>Emerging and Selected Topics in Power Electronics, IEEE Journal of >An Analytical Model for Predicting Turn-ON Overshoot in Normally-OFF GaN HEMTs
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An Analytical Model for Predicting Turn-ON Overshoot in Normally-OFF GaN HEMTs

机译:预测常压GaN Hemts在常压下的开启过冲的分析模型

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摘要

Recently, a major challenge in the adoption of wide bandgap semiconductors for power electronic applications is the need to trade device performance for device safety. In this article, methods for predicting gate voltage overshoot in normally-OFF gallium nitride (GAN) high electron mobility transistors (HEMTs) are derived in order to deliver optimal device performance. Two models are proposed; a simple, yet less accurate second order model and a complex, yet more accurate fourth order model. These models allow for the calculation of gate resistances necessary for a desired amount of gate voltage overshoot. The nonlinear capacitances of the device are considered in the analysis. The models are validated with an experimental double-pulse tester. These newly developed models allow design engineers to extract the best possible performance of commercially available GaN devices while keeping the devices in their safe-operating region.
机译:最近,采用宽带隙半导体的主要挑战是用于电力电子应用的宽带隙半导体是需要对设备安全进行设备性能的需求。在本文中,推导出用于预测常压氮化镓(GaN)高电子迁移率晶体管(HEMT)的栅极电压过冲的方法,以便提供最佳的装置性能。提出了两种模型;一个简单,更准确的二阶模型和一个复杂的,但更准确的第四阶模型。这些模型允许计算所需量的栅极电压过冲所需的栅极电阻。在分析中考虑了该装置的非线性电容。使用实验双脉冲测试仪验证模型。这些新开发的模型允许设计工程师提取商业上可获得的GaN设备的最佳性能,同时将设备保持在其安全操作区域。

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