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首页> 外文期刊>Electronics Letters >Strained p-channel InGaSb/AlGaSb modulation-doped field-effect transistors
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Strained p-channel InGaSb/AlGaSb modulation-doped field-effect transistors

机译:应变p沟道InGaSb / AlGaSb调制掺杂场效应晶体管

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摘要

Strained In/sub 0.25/Ga/sub 0.75/Sb p-channel modulation-doped field-effect transistors with Al/sub 0.75/Ga/sub 0.25/Sb Be-doped barrier layers are demonstrated. The extrinsic normalised transconductances for 1.2 mu m gate length devices range from 33 to 51 mS/mm at 300 K and from 132 to 161 mS/mm at 77 K. At 300 K, the devices operated in depletion mode with a threshold voltage of approximately 0.3 V, a normalised output conductance of less than 3mS/mm, and maximum drain current densities of approximately 20mA/mm. The devices show promise for complementary heterojunction field-effect transistor logic applications.
机译:说明了具有Al / sub 0.75 / Ga / sub 0.25 / Sb Be掺杂势垒层的应变In / sub 0.25 / Ga / sub 0.75 / Sb p沟道调制掺杂的场效应晶体管。栅极长度为1.2μm的器件的外在归一化跨导在300 K时为33至51 mS / mm,在77 K时为132至161 mS / mm。在300 K时,器件以耗尽模式工作,阈值电压约为0.3 V,归一化输出电导小于3mS / mm,最大漏极电流密度约为20mA / mm。这些器件有望用于互补异质结场效应晶体管逻辑应用。

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