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Optimization of Thin-Film Configuration for Light-Addressable Stimulation Electrode

机译:光寻址刺激电极的薄膜配置优化

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摘要

Light addressing is an emerging technique to optically address a virtual electrode on a photoconductive sub-strate. A thinner photoconductive layer of a light-addressable planar electrode can improve the spatial resolution of the light-addressed electrode. Voltage application to the electrode, however, causes a strong electric field across the thin photoconductive layer with a significant avalanche effect, which induces an undesired increase of dark current. In order to overcome this problem, we investigated how photoconductive-layer thickness and passivation-layer conductivity affect voltage-application-induced bright and dark charge densities. Suppression of the dark charge density with a thick photoconductive layer and a low-conductive passivation layer is found to be a key factor for optimization of the light-addressable electrode. With this design strategy, we developed a novel light-addressable electrode using titanium dioxide as a photocon-ductor. To suppress the avalanche effect, the thickness of the titanium-dioxide layer was designed to be 1.5 μm. The fabricated electrode turned out to have sufficient photoelectric properties: the bright charge density reached 70 μC/cm~2 and the bright-to-dark charge density ratio was greater than 10, which allows stimulation to cultured dissociated neurons.
机译:光寻址是一种新兴的技术,可以对光电导基板上的虚拟电极进行光学寻址。光寻址平面电极的较薄的光电导层可以改善光寻址电极的空间分辨率。然而,向电极施加电压会在整个光电导层上产生强电场,并产生明显的雪崩效应,这会引起暗电流的不良增加。为了克服这个问题,我们研究了光电导层的厚度和钝化层的电导率如何影响电压施加引起的亮和暗电荷密度。发现用厚的光电导层和低导电钝化层来抑制暗电荷密度是优化可光寻址电极的关键因素。通过这种设计策略,我们开发了一种使用二氧化钛作为光电导体的新型光寻址电极。为了抑制雪崩效应,将二氧化钛层的厚度设计为1.5μm。制成的电极具有足够的光电性能:亮电荷密度达到70μC/ cm〜2,明暗电荷密度比大于10,可以刺激培养的离体神经元。

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