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Light-addressable electrode with hydrogenated amorphous silicon and low-conductive passivation layer for stimulation of cultured neurons

机译:具有氢化非晶硅和低导电钝化层的光寻址电极,用于刺激培养的神经元

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摘要

The authors propose a light-addressable planar electrode with a simple three-layer laminated structure that can induce pinpoint neuronal activation on the culture substrate. The structure consists of a tin oxide (SnO_2), hydrogenated amorphous silicon (a-Si:H), and passivation layer. The passivation layer was a spin-coated low-conductive zinc antimonate (ZnOSb_2O_5)-dispersed epoxy, which was proved to be effective for preventing penetration of culture medium and thus avoiding deterioration of a-Si:H layer. Illumination to the electrode locally elevated the conductivity with 60-fold stimulus charge density. The fluo-4 calcium imaging of neurons cultured on the developed electrode showed that the neuronal activation was confined around the illuminated location, thus demonstrating the light-addressing capability of the proposed electrode.
机译:作者提出了一种具有简单三层层压结构的光寻址平面电极,该电极可以在培养基质上诱导精确的神经元活化。该结构由氧化锡(SnO_2),氢化非晶硅(a-Si:H)和钝化层组成。钝化层是旋涂的低导电性锑酸锌(ZnOSb_2O_5)分散的环氧树脂,被证明可有效防止培养基渗透,从而避免a-Si:H层变质。照射到电极上会以60倍的刺激电荷密度局部提高电导率。在发达电极上培养的神经元的fluo-4钙成像表明,神经元的激活被限制在照明位置附近,因此证明了拟议电极的光寻址能力。

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