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SURFACE ENERGY OF SEMICONDUCTORS COVERED WITH THIN LAYERS OF VARIOSU MATERIALS

机译:各种材料薄层覆盖的半导体的表面能

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Surface energy of III-V semiconductors ended by (110) clean surface and surface covered by atomci monolayer of aluminium, copper and sulphur has been calculated. We have used the Greens-function technique based on the scheme of linear muffin-tin orbitals in the atomic sphere Approximation (LMTO-ASA) for the crystal potential and with the local density approximation (LDA) for electrons. Two types of coverage are considered: full monolaeyr with two additional atoms per two-dimensional unit cell and half monolayer with one additional atom per unit cell. Full monolayer of metallic atoms increases the surface energy. Cu atoms lead to greater destabilization than Al atoms. Sulphur atoms stabilize the (110) surface for all considered compounds.
机译:已计算出以(110)清洁表面和铝,铜和硫原子单层覆盖的表面结束的III-V半导体的表面能。我们已经使用了格林斯函数技术,该技术基于原子球近似(LMTO-ASA)中线性线性松饼-锡轨道的晶势和电子的局部密度近似(LDA)。考虑了两种类型的覆盖:每个二维晶胞具有两个附加原子的完整单层结构,以及每个晶胞具有一个附加原子的半单层结构。金属原子的完整单层增加了表面能。铜原子比铝原子导致更大的去稳定作用。对于所有考虑的化合物,硫原子都能稳定(110)表面。

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